Vacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materials
Vacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materials
Vacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materials
Vacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materials
Vacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materials
Vacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materials

Vacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materials

$95,000.00 - 125,000.00/Set
Lead time
Quantity (Set) 1
Lead time (day)90
Customization

Logo (Min. order 1 Set)

Packaging (Min. order 1 Set)

Graphic (Min. order 1 Set)

Module Number
GJC-0612-C
Place of Origin
Shenzhen, Guangdong, China
Shipping
Ocean Freight, Land Freight

Product Description

Overview

Votage
380V
Power supply
KGPS/IGBT
Heater, muffle material
graphite /CFC
High Temperaure Volume
600×1200mm
Place of Origin
Hunan.China
Condition
New
Heating method
Resistance heating/induction heating
Machinery Test Report
Provided
Video outgoing-inspection
Provided
Warranty
1 year
Core Components
PLC
Brand Name
Jingtan
Certificates
ISO9001:2015/CE
Transport Package
Standard Exporting Wooden Box
Structure
Vertical or horizontal,Square or Round shape
Service Provided
Video technical support
After-sales Service Provided
Field maintenance and repair service

Product Details

Vacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materials

Vacuum deposition furnace

 

The Vacuum deposition furnace is used for the preparation of carbon-carbon composite materials, and the deposition furnace is mainly used for the preparation of pyrolytic carbon coating on the surface of graphite, semiconductor devices and heat-resistant scour materials.

Scope of application:

Graphite, semiconductor devices, heat-resistant scour materials.

1. Basic Parameters:

1) Design temperature: 1250℃/1650℃/1800℃/2200℃

2) Common temperature: 900~1200℃

3) Vacuum degree: < 50Pa

4) Pressure rise rate: 6.67pA /h(or 150Pa/24h) in cold state of empty furnace

5) Heating mode: graphite resistance heating or induction heating, independent temperature control, good temperature uniformity

6) Atmosphere medium: vacuum /CH4/C3H6/H2/N2/Ar

7) Gas control mode: mass flow meter control, multi-channel gas path, uniform flow field, no deposition dead Angle, good deposition effect;

Multi-stage and efficient exhaust treatment system, environmentally friendly, easy to clean up;

8) Furnace type: square, round, vertical or horizontal structure (non-standard design), fully enclosed deposition chamber, good sealing effect, strong anti-pollution ability;

9) Furnace cooling mode: furnace shell water cooling, external circulation quick cooling system can be selected, short cooling time, high production efficiency;

2. Structure of vacuum deposition furnace:

Structure form: horizontal - side discharge, vertical - up/down discharge

Furnace door locking mode: manual/automatic

Furnace shell material: inner stainless steel/all stainless steel

Insulation material: carbon felt/graphite felt/carbon fiber cured felt

Heater, muffle material: graphite /CFC

Infrared instrument: single colorimetric/double colorimetric

Power supply: KGPS/IGBT(only suitable for medium frequency heating)

 

3、Produce Specification 

Vacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materials

Vacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materialsVacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materialsVacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materialsVacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materialsVacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materialsVacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materialsVacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materialsVacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materialsVacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materialsVacuum Depositon furnace factory for Graphite, semiconductor devices, heat-resistant scour materials

Trading Area

Afghanistan, Austria, Armenia, Belarus, Belgium, Bulgaria, Canada, Central African Republic, Chile, Finland, France, Germany, Hungary, India, Indonesia, Iran, Iraq, Ireland, Israel, Italy, Japan, Korea, Mauritius, New Zealand, Norway, Peru, Philippines, Poland, Portugal, Romania, Russian Federation, Saudi Arabia, Singapore, Slovakia, Slovenia, South Africa, Spain, Sri Lanka, Sweden, Switzerland, Syrian Arab Republic, Thailand, Turkey, United Kingdom, United States, Viet Nam

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