Gallium arsenide GaAs crystal substrate semiconductor thin film manufacturers customize according to needs
Gallium arsenide GaAs crystal substrate semiconductor thin film manufacturers customize according to needs

Gallium arsenide GaAs crystal substrate semiconductor thin film manufacturers customize according to needs

$0.15
Place of Origin
China
Shipping
Air Freight, Ocean Freight, Land Freight

Product Description

Overview

brand
Dihedron
model
GAAS-1
Batch number
encapsulation
GAAS-2
packing
Class 100 clean bag, Class 1000 ultra clean room
Minimum packaging quantity
Crystalline system
cube
Lattice constant
A=5.65A
density
5.31 (g/cm3)
Size (mm)
Commonly used multiple specifications and customization
thickness
0.5mm, 1.0mm
Crystallographic orientation
<100>,<111>
doping
None, Si, Cr, Fe, Zn
Conductive type (corresponding)
SI, N, SI, N, P
Carrier concentration cm-3
To level 3 * 10 ^ 18
polishing
Single or double sided
Dislocation density cm-2
<5 × one hundred and five
Growth method
LEC, HB, etc
Main positioning edge
(0-1-1) ± 0.5deg, 16 ± 1.0mm/22 ± 1.0mm/32.5 ± 1.0mm
Secondary positioning edge
(0-11) ± 5.0 deg, 8 ± 1.0mm/11 ± 1.0mm/18 ± 1.0mm
Saleable land
nationwide

Product Details

Gallium arsenide GaAs crystal substrate semiconductor thin film manufacturers customize according to needs

Gallium arsenide (GaAs) is an important Ⅲ - Ⅴ direct band gap semiconductor material with a band gap width of about 1.43 eV. Compared with silicon, GaAs has a higher Electron mobility, which makes it advantageous in manufacturing high-speed electronic devices, such as RF devices and optoelectronic devices.

GaAs crystals have excellent optical properties and can be used to manufacture optoelectronic devices such as lasers, photodiodes, and solar cells. At the same time, because of its high Electron mobility, GaAs is also widely used to manufacture high-speed electronic devices, such as High-electron-mobility transistor (HEMT) and pseudopotential power FET (PHEMT).

Although the preparation process of GaAs crystals is more complex and costly than silicon, their superior performance in high-speed, high-frequency, optoelectronic and other fields has made them widely used in many special applications. In the future, with the progress of preparation processes and the reduction of costs, we can expect the application of GaAs crystals in fields such as high-speed communication, optoelectronics, and solar cells to further expand.


application


-Microwave RF applications: Power amplifiers in mobile phones and wireless network devices.
-Optoelectronic devices: such as solar cells, laser diodes, and photodetectors.
-Integrated circuits: such as electronic switches, signal processors, etc.


characteristic


-High Electron mobility: It is conducive to the manufacturing of high-frequency and high-speed equipment.
-Good optoelectronic characteristics: suitable for the manufacturing of optoelectronic devices.
-Low noise: It has advantages in RF applications.


Gallium arsenide GaAs crystal substrate semiconductor thin film manufacturers customize according to needs
Gallium arsenide GaAs crystal substrate semiconductor thin film manufacturers customize according to needs
Gallium arsenide GaAs crystal substrate semiconductor thin film manufacturers customize according to needs
Gallium arsenide GaAs crystal substrate semiconductor thin film manufacturers customize according to needs

Trading Area

Global

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Shanghai, China
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